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Equipements

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Elaboration equipment

  • Deposit by sputtering (magnetron reactive sputtering)
  • AJA (5 cathods confocal)
  • Meca 2000 (3 cathods)
  • Sominex (2 cathods)
  • Built designed and manufactured locally

Structural characterization

  • AFM
  • Microscope
  • Transmission Electronic Microscope (TEM) (au CNRT )
  • Scanning Electron Microscopy (SEM)
  • Bench Conductivity measurement
  • Diffractometer and X Reflectometer
  • FTIR

Optical characterization

  • M-Lines (index and thickness of thin layer)
  • Raman
  • Ellipsometer UVISEL Horiba Jobin-Yvon
  • Spectrophotometer Perkin Elmer lambda 1050 with URA and 150mm integrating sphere
  • Photoluminescence bench with Argon CW laser (Innova 90C 458,476,488 et 514nm)
  • Photoluminescence bench with OPO (Optical Parametric Oscillator) type nanosecond pulsed laser (EKSPLA NT342B from 210 to 2500nm)
  • Photoluminescence excitation bench with 1kW Xenon lamp